137781 -OEChem-03010813442D 9 8 0 0 0 0 0 0 0999 V2000 0.1449 0.0599 0.0000 S 0 0 0 0 0 0 0 0 0 0 0 0 -1.0649 0.0599 0.0000 Si 0 0 0 0 0 0 0 0 0 0 0 0 0.9149 0.0599 0.0000 Si 0 0 0 0 0 0 0 0 0 0 0 0 -1.9349 0.0599 0.0000 C 0 0 0 0 0 0 0 0 0 0 0 0 -1.0649 0.7699 0.0000 C 0 0 0 0 0 0 0 0 0 0 0 0 -1.0649 -0.8100 0.0000 C 0 0 0 0 0 0 0 0 0 0 0 0 0.9149 0.7699 0.0000 C 0 0 0 0 0 0 0 0 0 0 0 0 0.9149 -0.8100 0.0000 C 0 0 0 0 0 0 0 0 0 0 0 0 2.1549 0.0599 0.0000 C 0 0 0 0 0 0 0 0 0 0 0 0 1 2 1 0 0 0 0 1 3 1 0 0 0 0 2 4 1 0 0 0 0 2 5 1 0 0 0 0 2 6 1 0 0 0 0 3 7 1 0 0 0 0 3 8 1 0 0 0 0 3 9 1 0 0 0 0 M END > 0 > 0 > 137781 > 2 > DTP/NCI > 252160 > DTP/NCI from molfile. Release-June 2007. Structure Evaluation:Consistent with Molecular Formula. Deposition record created from database webdb on host dtpiv1.ncifcrf.gov on Feb 22, 2008 > 3385-94-2 Bis(trimethylsilyl)sulfide Disilathiane, hexamethyl- Disilthiane, hexamethyl- Hexamethyldisilthiane NSC252160 > 3385-94-2 > 252160 > http://dtp.nci.nih.gov/ > http://dtp.nci.nih.gov/dtpstandard/servlet/dwindex?searchtype=NSC&outputformat=html&searchlist=252160 > 76920 1 $$$$