444898 -OEChem-03010813462D 8 7 0 0 0 0 0 0 0999 V2000 -0.6050 0.2910 0.0000 Si 0 0 0 0 0 0 0 0 0 0 0 0 -1.1050 -0.5749 0.0000 C 0 0 0 0 0 0 0 0 0 0 0 0 0.2610 -0.2089 0.0000 C 0 0 0 0 0 0 0 0 0 0 0 0 -0.4949 0.5389 0.0000 C 0 0 0 0 0 0 0 0 0 0 0 0 -1.4710 0.7910 0.0000 C 0 0 0 0 0 0 0 0 0 0 0 0 -2.3750 -0.5749 0.0000 C 0 0 0 0 0 0 0 0 0 0 0 0 2.8550 -0.5749 0.0000 C 0 0 0 0 0 0 0 0 0 0 0 0 0.9860 0.5389 0.0000 C 0 0 0 0 0 0 0 0 0 0 0 0 1 2 1 0 0 0 0 1 3 1 0 0 0 0 1 4 1 0 0 0 0 1 5 1 0 0 0 0 2 6 2 0 0 0 0 3 7 2 0 0 0 0 4 8 2 0 0 0 0 M END > 0 > 0 > 444898 > 2 > DTP/NCI > 174168 > DTP/NCI from molfile. Release-June 2007. Structure Evaluation:Consistent with Molecular Formula. Deposition record created from database webdb on host dtpiv1.ncifcrf.gov on Feb 22, 2008 > 18244-95-6 NSC174168 Silane, triethenylmethyl- Trivinylmethylsilane > 18244-95-6 > 174168 > http://dtp.nci.nih.gov/ > http://dtp.nci.nih.gov/dtpstandard/servlet/dwindex?searchtype=NSC&outputformat=html&searchlist=174168 > 87525 1 $$$$