97800 -OEChem-03010813442D 9 8 0 0 0 0 0 0 0999 V2000 0.1160 1.1630 0.0000 Si 0 0 0 0 0 0 0 0 0 0 0 0 -0.7500 -0.3369 0.0000 Si 0 0 0 0 0 0 0 0 0 0 0 0 0.1160 0.1630 0.0000 O 0 0 0 0 0 0 0 0 0 0 0 0 0.1160 2.1630 0.0000 C 0 0 0 0 0 0 0 0 0 0 0 0 -0.8839 1.1630 0.0000 C 0 0 0 0 0 0 0 0 0 0 0 0 1.1160 1.1630 0.0000 C 0 0 0 0 0 0 0 0 0 0 0 0 -1.2499 0.5290 0.0000 C 0 0 0 0 0 0 0 0 0 0 0 0 -1.6160 -0.8369 0.0000 C 0 0 0 0 0 0 0 0 0 0 0 0 -0.2500 -1.2030 0.0000 C 0 0 0 0 0 0 0 0 0 0 0 0 1 3 1 0 0 0 0 1 4 1 0 0 0 0 1 5 1 0 0 0 0 1 6 1 0 0 0 0 2 3 1 0 0 0 0 2 7 1 0 0 0 0 2 8 1 0 0 0 0 2 9 1 0 0 0 0 M END > 0 > 0 > 97800 > 2 > DTP/NCI > 43346 > DTP/NCI from molfile. Release-June 2007. Structure Evaluation:Consistent with Molecular Formula. Deposition record created from database webdb on host dtpiv1.ncifcrf.gov on Feb 22, 2008 > 107-46-0 Bis(trimethylsilyl) ether Bis(trimethylsilyl) oxide Disiloxane, hexamethyl- Fluka AG Hexamethyldisiloxane NSC43346 Oxybis(trimethylsilane) Silane, oxybis(trimethyl)- WLN: 1-SI-1&1&O-SI-1&1&1 > 107-46-0 > 43346 > http://dtp.nci.nih.gov/ > http://dtp.nci.nih.gov/dtpstandard/servlet/dwindex?searchtype=NSC&outputformat=html&searchlist=43346 > 24764 1 $$$$